Study of Conbfe Films Deposited by Dc Magnetron Sputtering

G Pan, AG Spencer, RP Howson

Research output: Contribution to journalArticlepeer-review

Abstract

CoNbFe films were deposited by dc multisource sputtering and unbalanced dc single magnetron sputtering. The film structures and magnetic properties were studied as a function of film composition and deposition parameters. TEM study of the film structure and the measurement of film resistivity showed that films containing more than 12 at % of Nb are amorphous, with a transition to crystalline films occurring in the 12-to-9-at% range. The addition of small amounts of Fe reduces the H(c) of the as-deposited films. For Co87-(x)Nb13Fe(x) films, the optimum Fe content is 5.0 at%. The minimum H(c) of CoNbFe films made by the multisource was 17 A/m, with a large anisotropy field H(k). Films made from a composite target on a single unbalanced magnetron had a minimum H(c) of 6 A/m and a minimum H(k) of 15 A/m. This is attributed to the low-energy and high-density ion bombardment of the growing films and the smaller angle of incidence from the single source.
Original languageEnglish
Pages (from-to)664-668
Number of pages0
JournalIeee T Magn
Volume27
Issue number1
Publication statusPublished - 1991
EventIeee Transactions on Magnetics -
Duration: 1 Jan 1999 → …

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