Nanofabrication of SiC templates for direct hot embossing for metallic photonic structures and meta materials

Yifang Chen; Yun Zhou; Genhua Pan; Ejaz Huq; Bing Rui Lu; Shen Qi Xie; Jing Wan; Zhen Shu; Xin Ping Qu; Ran Liu; S. Banu; S. Birtwell; Liudi Jiang

doi:10.1016/j.mee.2008.01.002

Nanofabrication of SiC templates for direct hot embossing for metallic photonic structures and meta materials

Yifang Chen^*, Yun Zhou, Genhua Pan, Ejaz Huq, Bing Rui Lu, Shen Qi Xie, Jing Wan, Zhen Shu, Xin Ping Qu, Ran Liu, S. Banu, S. Birtwell, Liudi Jiang

^*Corresponding author for this work

School of Engineering, Computing and Mathematics

Research output: Contribution to journal › Article › peer-review

Abstract

A reliable nanofabrication process for hard templates in SiC amorphous film was developed. The process involves high resolution electron beam lithography and reactive ion etch for nanosize structures in SiC. Study of the RIE property in SiC narrow trenches and dot array indicates that various profiles of sidewall can be achieved by controlling the etch power and ratio of fluorine-based gas mixture. It was also discovered that SiC material is RIE lag free in dry etch, which opens up a broader applications for deep and narrow structures. Applications of SiC templates for hot embossing into metals and plastics prove that the SiC templates formed in amorphous film are hard enough for the fabrications of metallic photonic structures and meta materials. (C) 2008 Elsevier B.V. All rights reserved.

Original language	English
Pages (from-to)	1147-1151
Number of pages	0
Journal	Microelectronic Engineering
Volume	85
Issue number	0
DOIs	https://doi.org/10.1016/j.mee.2008.01.002
Publication status	Published - 1 May 2008
Event	Microelectronic Engineering - Duration: 1 May 2008 → …

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10.1016/j.mee.2008.01.002

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title = "Nanofabrication of SiC templates for direct hot embossing for metallic photonic structures and meta materials",

abstract = "A reliable nanofabrication process for hard templates in SiC amorphous film was developed. The process involves high resolution electron beam lithography and reactive ion etch for nanosize structures in SiC. Study of the RIE property in SiC narrow trenches and dot array indicates that various profiles of sidewall can be achieved by controlling the etch power and ratio of fluorine-based gas mixture. It was also discovered that SiC material is RIE lag free in dry etch, which opens up a broader applications for deep and narrow structures. Applications of SiC templates for hot embossing into metals and plastics prove that the SiC templates formed in amorphous film are hard enough for the fabrications of metallic photonic structures and meta materials. (C) 2008 Elsevier B.V. All rights reserved.",

author = "Yifang Chen and Yun Zhou and Genhua Pan and Ejaz Huq and Lu, {Bing Rui} and Xie, {Shen Qi} and Jing Wan and Zhen Shu and Qu, {Xin Ping} and Ran Liu and S. Banu and S. Birtwell and Liudi Jiang",

year = "2008",

month = may,

day = "1",

doi = "10.1016/j.mee.2008.01.002",

language = "English",

volume = "85",

pages = "1147--1151",

journal = "Microelectronic Engineering",

issn = "0167-9317",

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note = "Microelectronic Engineering ; Conference date: 01-05-2008",

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TY - JOUR

T1 - Nanofabrication of SiC templates for direct hot embossing for metallic photonic structures and meta materials

AU - Chen, Yifang

AU - Zhou, Yun

AU - Pan, Genhua

AU - Huq, Ejaz

AU - Lu, Bing Rui

AU - Xie, Shen Qi

AU - Wan, Jing

AU - Shu, Zhen

AU - Qu, Xin Ping

AU - Liu, Ran

AU - Banu, S.

AU - Birtwell, S.

AU - Jiang, Liudi

PY - 2008/5/1

Y1 - 2008/5/1

N2 - A reliable nanofabrication process for hard templates in SiC amorphous film was developed. The process involves high resolution electron beam lithography and reactive ion etch for nanosize structures in SiC. Study of the RIE property in SiC narrow trenches and dot array indicates that various profiles of sidewall can be achieved by controlling the etch power and ratio of fluorine-based gas mixture. It was also discovered that SiC material is RIE lag free in dry etch, which opens up a broader applications for deep and narrow structures. Applications of SiC templates for hot embossing into metals and plastics prove that the SiC templates formed in amorphous film are hard enough for the fabrications of metallic photonic structures and meta materials. (C) 2008 Elsevier B.V. All rights reserved.

AB - A reliable nanofabrication process for hard templates in SiC amorphous film was developed. The process involves high resolution electron beam lithography and reactive ion etch for nanosize structures in SiC. Study of the RIE property in SiC narrow trenches and dot array indicates that various profiles of sidewall can be achieved by controlling the etch power and ratio of fluorine-based gas mixture. It was also discovered that SiC material is RIE lag free in dry etch, which opens up a broader applications for deep and narrow structures. Applications of SiC templates for hot embossing into metals and plastics prove that the SiC templates formed in amorphous film are hard enough for the fabrications of metallic photonic structures and meta materials. (C) 2008 Elsevier B.V. All rights reserved.

U2 - 10.1016/j.mee.2008.01.002

DO - 10.1016/j.mee.2008.01.002

M3 - Article

SN - 0167-9317

VL - 85

SP - 1147

EP - 1151

JO - Microelectronic Engineering

JF - Microelectronic Engineering

IS - 0

T2 - Microelectronic Engineering

Y2 - 1 May 2008

ER -

Nanofabrication of SiC templates for direct hot embossing for metallic photonic structures and meta materials

Abstract

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