Magnetoresistance in Thin Permalloy Film (10nm-thick and 30-200nm-wide) Nanocontacts Fabricated by e-Beam Lithography

Research output: Working paper / Preprint › Preprint

Keywords

@techreport{af7463db735a4c079405c4a2a150efc0,

title = "Magnetoresistance in Thin Permalloy Film (10nm-thick and 30-200nm-wide) Nanocontacts Fabricated by e-Beam Lithography",

keywords = "40 Engineering, 51 Physical Sciences, 5104 Condensed Matter Physics",

author = "N Garcia and C Hao and L Yonghua and M Munoz and Yifang Chen and Z Lu and Y Zhou and G Pan and Z Cui and AA Pasa",

year = "2006",

month = jul,

day = "24",

doi = "10.48550/arxiv.cond-mat/0607608",

language = "English",

type = "WorkingPaper",

}

TY - UNPB

T1 - Magnetoresistance in Thin Permalloy Film (10nm-thick and 30-200nm-wide) Nanocontacts Fabricated by e-Beam Lithography

AU - Garcia, N

AU - Hao, C

AU - Yonghua, L

AU - Munoz, M

AU - Chen, Yifang

AU - Lu, Z

AU - Zhou, Y

AU - Pan, G

AU - Cui, Z

AU - Pasa, AA

PY - 2006/7/24

Y1 - 2006/7/24

KW - 40 Engineering

KW - 51 Physical Sciences

KW - 5104 Condensed Matter Physics

U2 - 10.48550/arxiv.cond-mat/0607608

DO - 10.48550/arxiv.cond-mat/0607608

M3 - Preprint

BT - Magnetoresistance in Thin Permalloy Film (10nm-thick and 30-200nm-wide) Nanocontacts Fabricated by e-Beam Lithography

ER -