Magnetoresistance in thin Permalloy film (10 nm thick and 30-200 nm wide) nanocontacts fabricated by e-beam lithography

N Garcia, C Hao, YH Lu, M Munoz, YF Chen, Z Cui, ZQ Lu, Y Zhou, GH Pan, AA Pasa

Research output: Contribution to journal › Article › peer-review

Cite this

@article{3df2d5b8bbb9497fbb662c25ef70eada,

title = "Magnetoresistance in thin Permalloy film (10 nm thick and 30-200 nm wide) nanocontacts fabricated by e-beam lithography",

author = "N Garcia and C Hao and YH Lu and M Munoz and YF Chen and Z Cui and ZQ Lu and Y Zhou and GH Pan and AA Pasa",

year = "2006",

month = jan,

day = "1",

language = "English",

volume = "89",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

number = "8",

}

TY - JOUR

T1 - Magnetoresistance in thin Permalloy film (10 nm thick and 30-200 nm wide) nanocontacts fabricated by e-beam lithography

AU - Garcia, N

AU - Hao, C

AU - Lu, YH

AU - Munoz, M

AU - Chen, YF

AU - Cui, Z

AU - Lu, ZQ

AU - Zhou, Y

AU - Pan, GH

AU - Pasa, AA

PY - 2006/1/1

Y1 - 2006/1/1

M3 - Article

SN - 0003-6951

VL - 89

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 8

ER -