Fabrication of ferromagnetic nanoconstrictions by electron beam lithography using LOR/PMMA bilayer technique

Research output: Contribution to journal › Article › peer-review

Original language	English
Pages (from-to)	1499-1502
Number of pages	3
Journal	Microelectronic Engineering
Volume	84
Issue number	0
Publication status	Published - 1 Jan 2007

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@article{26b1f246401a4755a7facd539b5a850f,

title = "Fabrication of ferromagnetic nanoconstrictions by electron beam lithography using LOR/PMMA bilayer technique",

author = "YF Chen and ZQ Lu and XD Wang and Z Cui and GH Pan and Y Zhou and M Munoz and C Hao and YH Lu and N Garcia",

year = "2007",

month = jan,

day = "1",

language = "English",

volume = "84",

pages = "1499--1502",

journal = "Microelectronic Engineering",

issn = "0167-9317",

publisher = "Elsevier B.V.",

number = "0",

}

TY - JOUR

T1 - Fabrication of ferromagnetic nanoconstrictions by electron beam lithography using LOR/PMMA bilayer technique

AU - Chen, YF

AU - Lu, ZQ

AU - Wang, XD

AU - Cui, Z

AU - Pan, GH

AU - Zhou, Y

AU - Munoz, M

AU - Hao, C

AU - Lu, YH

AU - Garcia, N

PY - 2007/1/1

Y1 - 2007/1/1

M3 - Article

SN - 0167-9317

VL - 84

SP - 1499

EP - 1502

JO - Microelectronic Engineering

JF - Microelectronic Engineering

IS - 0

ER -