Deep UV hardening of photoresist for shaping of graphene and lift-off fabrication of back-gated field effect biosensors by ion-milling and sputter deposition

Bing Li; Genhua Pan; Ahmed Suhail; Kamrul Islam; Neil Avent; Paul Davey

doi:10.1016/j.carbon.2017.03.032

Deep UV hardening of photoresist for shaping of graphene and lift-off fabrication of back-gated field effect biosensors by ion-milling and sputter deposition

Bing Li^*
, Genhua Pan
, Ahmed Suhail
, Kamrul Islam
, Neil Avent
, Paul Davey

^*Corresponding author for this work

School of Engineering, Computing and Mathematics

Imperial College London

Research output: Contribution to journal › Article › peer-review

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Original language	English
Pages (from-to)	43-49
Number of pages	0
Journal	Carbon
Volume	118
Issue number	0
Early online date	14 Mar 2017
DOIs	https://doi.org/10.1016/j.carbon.2017.03.032
Publication status	Published - Jul 2017

UN SDGs

This output contributes to the following UN Sustainable Development Goals (SDGs)

SDG 9 Industry, Innovation, and Infrastructure

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10.1016/j.carbon.2017.03.032

Bing Li 2017 1-s2

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@article{4418c160f14c465287aba79e8f51d848,

title = "Deep UV hardening of photoresist for shaping of graphene and lift-off fabrication of back-gated field effect biosensors by ion-milling and sputter deposition",

author = "Bing Li and Genhua Pan and Ahmed Suhail and Kamrul Islam and Neil Avent and Paul Davey",

year = "2017",

month = jul,

doi = "10.1016/j.carbon.2017.03.032",

language = "English",

volume = "118",

pages = "43--49",

journal = "Carbon",

issn = "0008-6223",

publisher = "Elsevier Ltd.",

number = "0",

}

TY - JOUR

T1 - Deep UV hardening of photoresist for shaping of graphene and lift-off fabrication of back-gated field effect biosensors by ion-milling and sputter deposition

AU - Li, Bing

AU - Pan, Genhua

AU - Suhail, Ahmed

AU - Islam, Kamrul

AU - Avent, Neil

AU - Davey, Paul

PY - 2017/7

Y1 - 2017/7

UR - https://pearl.plymouth.ac.uk/secam-research/124/

U2 - 10.1016/j.carbon.2017.03.032

DO - 10.1016/j.carbon.2017.03.032

M3 - Article

SN - 0008-6223

VL - 118

SP - 43

EP - 49

JO - Carbon

JF - Carbon

IS - 0

ER -

Deep UV hardening of photoresist for shaping of graphene and lift-off fabrication of back-gated field effect biosensors by ion-milling and sputter deposition

UN SDGs

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