Deep UV hardening of photoresist for shaping of graphene and lift-off fabrication of back-gated field effect biosensors by ion-milling and sputter deposition

Bing Li; Genhua Pan; Ahmed Suhail; Kamrul Islam; Neil Avent; Paul Davey

doi:10.1016/j.carbon.2017.03.032

Deep UV hardening of photoresist for shaping of graphene and lift-off fabrication of back-gated field effect biosensors by ion-milling and sputter deposition

Bing Li^*, Genhua Pan, Ahmed Suhail, Kamrul Islam, Neil Avent, Paul Davey

^*Corresponding author for this work

School of Engineering, Computing and Mathematics

Imperial College London

Research output: Contribution to journal › Article › peer-review

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Original language	English
Pages (from-to)	43-49
Number of pages	0
Journal	Carbon
Volume	118
Issue number	0
Early online date	14 Mar 2017
DOIs	https://doi.org/10.1016/j.carbon.2017.03.032
Publication status	Published - Jul 2017

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10.1016/j.carbon.2017.03.032

Bing Li 2017 1-s2

Cite this

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title = "Deep UV hardening of photoresist for shaping of graphene and lift-off fabrication of back-gated field effect biosensors by ion-milling and sputter deposition",

author = "Bing Li and Genhua Pan and Ahmed Suhail and Kamrul Islam and Neil Avent and Paul Davey",

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AU - Li, Bing

AU - Pan, Genhua

AU - Suhail, Ahmed

AU - Islam, Kamrul

AU - Avent, Neil

AU - Davey, Paul

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U2 - 10.1016/j.carbon.2017.03.032

DO - 10.1016/j.carbon.2017.03.032

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SP - 43

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